DocumentCode
2684681
Title
Characteristics of an electron cyclotron resonance multicusp plasma source
Author
Tsai, C.C. ; Berry, L.A. ; Haselton, H.H. ; Schechter, D.E.
fYear
1990
fDate
21-23 May 1990
Firstpage
160
Abstract
Summary form only given. An electron cyclotron resonance (ECR) multicusp plasma source has been developed by using two ECR plasma production layers and multicusp plasma confinement. The effect of the length of the multicusp plasma chamber on the radial plasma uniformity has been investigated. It was found that the plasma chamber length can affect the initiation of discharges. The plasma source can be applied to thin film plasma processing
Keywords
plasma confinement; plasma production; ECR plasma production layers; discharges; electron cyclotron resonance multicusp plasma source; plasma chamber; plasma confinement; radial plasma uniformity; thin film plasma processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location
Oakland, CA, USA
Type
conf
DOI
10.1109/PLASMA.1990.110709
Filename
5725981
Link To Document