DocumentCode
2686737
Title
Scaling laws for Mirrortron ion accelerators
Author
Post, R.F.
fYear
1990
fDate
21-23 May 1990
Firstpage
206
Abstract
Summary form only given. As each mirror coil in the Mirrortron is pulsed on, the hot electrons, being repelled by the mirror field, set up strong local potentials through the usual quasi-neutral plasma response. Most important is the theoretically predicted result that these fields can be precisely controlled from outside the plasma by shaping and timing the pulsed mirror fields. Using this quasi-neutral assumption, it is possible to predict both the scaling laws for Mirrortron ion accelerators and the screening out of the space charge fields of the ion beam itself that will occur within the plasma. It is this screening effect that should permit the acceleration of much higher beam currents than is possible with vacuum-field-based ion accelerators. Augmenting this high beam current capability is the circumstance that much of the energy required to accelerate a high-current-beam ion bunch can be derived in situ from kinetic energy stored up in the hot electron population, and therefore in large part need not be derived from the applied pulsed mirror fields. Using the scaling laws derived, studies were made of the key parameters of (1) a 10-GeV, 1-MJ, heavy-ion accelerator such as might be employed as a driver for inertial-fusion purposes and (2) a scaled-down bench-top Mirrortron that could be built to explore many of the critical physics issues, such as space-charge screening and beam emittance control, that would be encountered in a full-scale accelerator
Keywords
ion accelerators; magnetic mirrors; 1 MJ; 10 GeV; Mirrortron ion accelerators; beam currents; beam emittance control; critical physics; driver; energy storage; hot electrons; inertial-fusion; kinetic energy; mirror coil; mirror field; pulsed mirror fields; quasi-neutral assumption; scaling laws; screening effect; space-charge screening; strong local potentials; vacuum-field-based ion accelerators;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location
Oakland, CA, USA
Type
conf
DOI
10.1109/PLASMA.1990.110833
Filename
5726103
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