• DocumentCode
    2688724
  • Title

    The thermodynamic analysis of tri-isopropoxyaluminium pyrolysis

  • Author

    Tomilin, Vladimir I. ; Shumeyev, Vasiliy N.

  • Author_Institution
    Krasnoyarsk State Tech. Univ., Russia
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    81
  • Lastpage
    84
  • Abstract
    The purpose of this paper is a theoretical examination of Al(OC 3H7)3 pyrolysis and finding of thermodynamic quantities which are necessary for optimal technological modes of pure Al2O3 films production on a GaAs surface
  • Keywords
    MOCVD; alumina; enthalpy; entropy; free energy; heat of formation; organometallic compounds; pyrolysis; Al2O3; GaAs; Gibbs energy; alumina films production; contamination elimination; enthalpy; entropy; optimal technological modes; temperature dependence; thermodynamic analysis; tri-isopropoxyaluminium pyrolysis; vapour pressure; Aluminum oxide; Chemical analysis; Chemical technology; Coatings; Contamination; Impedance; Optimized production technology; Solid state circuits; Temperature; Thermodynamics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials, 2000. EDM 2000. Siberian Russian Student Workshops on
  • Conference_Location
    Novosibirsk
  • Print_ISBN
    5-7782-0291-1
  • Type

    conf

  • DOI
    10.1109/SREDM.2000.888558
  • Filename
    888558