DocumentCode
2690
Title
Transparent Junctionless Thin-Film Transistors With Tunable Operation Mode
Author
Gengming Zhang ; Qing Wan ; Jia Sun ; Guodong Wu ; Liqiang Zhu
Author_Institution
Ningbo Inst. of Mater. Technol. & Eng., Ningbo, China
Volume
34
Issue
2
fYear
2013
fDate
Feb. 2013
Firstpage
265
Lastpage
267
Abstract
Junctionless low-voltage transparent indium-zinc-oxide (IZO) thin-film transistors (TFTs) gated by SiO2-based solid electrolyte films are fabricated on glass substrates by a full room-temperature process. The attractive feature of such TFTs is that the channel and source/drain electrodes are the same ultrathin IZO film without any source/drain electrodes. The operation mode of such devices can be tuned from depletion mode to enhancement mode when the thickness of the IZO film is reduced from 30 to 10 nm. Devices operated in both modes show a small subthreshold swing of <; 120 mV/dec and a large current on/off ratio of >; 106.
Keywords
II-VI semiconductors; electrochemical electrodes; indium compounds; low-power electronics; solid electrolytes; thin film transistors; wide band gap semiconductors; zinc compounds; In2O3-ZnO; SiO2; TFT; channel electrode; depletion mode; enhancement mode; size 30 nm to 10 nm; solid electrolyte film; source-drain electrode; temperature 293 K to 298 K; transparent junctionless low-voltage thin-film transistor; tunable operation mode; Electrodes; Glass; Logic gates; Plasma temperature; Substrates; Thin film transistors; Indium-zinc-oxide (IZO); junctionless transparent transistors; operation mode modulation;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2232277
Filename
6407736
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