• DocumentCode
    2690
  • Title

    Transparent Junctionless Thin-Film Transistors With Tunable Operation Mode

  • Author

    Gengming Zhang ; Qing Wan ; Jia Sun ; Guodong Wu ; Liqiang Zhu

  • Author_Institution
    Ningbo Inst. of Mater. Technol. & Eng., Ningbo, China
  • Volume
    34
  • Issue
    2
  • fYear
    2013
  • fDate
    Feb. 2013
  • Firstpage
    265
  • Lastpage
    267
  • Abstract
    Junctionless low-voltage transparent indium-zinc-oxide (IZO) thin-film transistors (TFTs) gated by SiO2-based solid electrolyte films are fabricated on glass substrates by a full room-temperature process. The attractive feature of such TFTs is that the channel and source/drain electrodes are the same ultrathin IZO film without any source/drain electrodes. The operation mode of such devices can be tuned from depletion mode to enhancement mode when the thickness of the IZO film is reduced from 30 to 10 nm. Devices operated in both modes show a small subthreshold swing of <; 120 mV/dec and a large current on/off ratio of >; 106.
  • Keywords
    II-VI semiconductors; electrochemical electrodes; indium compounds; low-power electronics; solid electrolytes; thin film transistors; wide band gap semiconductors; zinc compounds; In2O3-ZnO; SiO2; TFT; channel electrode; depletion mode; enhancement mode; size 30 nm to 10 nm; solid electrolyte film; source-drain electrode; temperature 293 K to 298 K; transparent junctionless low-voltage thin-film transistor; tunable operation mode; Electrodes; Glass; Logic gates; Plasma temperature; Substrates; Thin film transistors; Indium-zinc-oxide (IZO); junctionless transparent transistors; operation mode modulation;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2232277
  • Filename
    6407736