DocumentCode
2693943
Title
Milliwatt power 245 nm deep ultraviolet light-emitting diodes
Author
Sun, Wenhong ; Shatalov, Max ; Hu, Xuhong ; Yang, Jinwei ; Lunev, Alex ; Bilenko, Yuri ; Shur, Michael ; Gaska, Remis
Author_Institution
Sensor Electron. Technol., Inc., Columbia, SC, USA
fYear
2009
fDate
22-24 June 2009
Firstpage
109
Lastpage
110
Abstract
The paper presents a 245 nm LEDs with milliwatt continuous wave power achieved for devices with large junction area. DUV LED structure used in this work consisted of very high quality n +-AlGaN emitter/cladding layers, AlGaN multiple quantum well active region, Mg -doped p -AlGaN cladding, and p + -AlInGaN contact layers which were grown over (0001) sapphire substrates using combination of conventional MOCVD and proprietary MEMOCVD R process. After growth, LED wafers were processed into devices using standard RIE etching and e -beam metallization steps. These results obtain from this device represents the highest continuous wave output powers reported for sub-250 nm wavelength semiconductor light source.
Keywords
III-V semiconductors; MOCVD coatings; aluminium compounds; gallium compounds; light emitting diodes; quantum well devices; sapphire; semiconductor device metallisation; sputter etching; ultraviolet sources; wide band gap semiconductors; Al2O3; AlGaN; AlInGaN; DUV LED structure; MEMOCVD R process; RIE etching; deep ultraviolet light emitting diodes; electron beam metallization; emitter-cladding layer; multiple quantum well; sapphire substrate; wavelength 245 nm; Light emitting diodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2009. DRC 2009
Conference_Location
University Park, PA
Print_ISBN
978-1-4244-3528-9
Electronic_ISBN
978-1-4244-3527-2
Type
conf
DOI
10.1109/DRC.2009.5354975
Filename
5354975
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