Measurement of the Spatial Uniformity of a Large Field Microstructured Retarder

Author

Urbanczyk, Adam ; Schumann, Melanie ; Bläsi, Benedikt ; Gombert, Andreas

Author_Institution

Inst. of Phys., Wroclaw Univ. of Technol.

Volume

4

fYear

2006

fDate

18-22 June 2006

Firstpage

170

Lastpage

173

Abstract

We report on experimental characterization of a microstructured optical retarder fabricated using interference lithography technique. The microstructured element is designed to be a quarter-wave plate in visible range. The measurements of retardation distribution were carried out against wavelength in incoherent light using a rotating analyzer technique. We also investigated the dependence of retardation upon angle of incidence for two orientations of the rotation axis. The measurements showed that the birefringent microstructured element is relatively uniform and introduces 70deg retardation at lambda=510 nm

Keywords

birefringence; micro-optics; optical design techniques; optical retarders; optical testing; photolithography; 510 nm; birefringent element; incoherent light; interference lithography; large field retarder; microstructured element; microstructured retarder; optical retarder; quarter-wave plate; retardation distribution; rotating analyzer technique; spatial uniformity measurement; Azimuth; Birefringence; Charge coupled devices; Image analysis; Interference; Lithography; Optical retarders; Polarization; Rotation measurement; Wavelength measurement; form birefringence; microstructured optical elements; retardation plate;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2006 International Conference on

Conference_Location

Nottingham

Print_ISBN

1-4244-0235-2

Electronic_ISBN

1-4244-0236-0

Type

conf

DOI

10.1109/ICTON.2006.248530

Filename

4013890