Characterization of Annealed Ni/Cu Multilayers on Si(100)

Author

Zolanvari, A. ; Sadeghi, H.

Author_Institution

Dept. of Phys. Arak, Univ. of Arak, Arak, Iran

fYear

2009

fDate

28-30 Dec. 2009

Firstpage

99

Lastpage

101

Abstract

This paper reports the grown of Ni/Cu multilayers on Si monocrystalline substrates and shows some polarization investigations of Si(100) substrates. Nano structural characterization of the multilayers by high angle X-ray diffraction (XRD) and high temperature X-ray diffraction (HT-XRD) also have been presented. Annealed Ni/Cu multilayers on Si(100) substrate has been reported. The main purpose of present work is to study the Ni/Cu multilayer when it was annealed. Finally we presented the influence of bilayer and sublayer (Ni and Cu) thicknesses on the magnetic properties of multilayers.

Keywords

X-ray diffraction; annealing; elemental semiconductors; multilayers; nanostructured materials; silicon; substrates; HT-XRD; Ni/Cu multilayers; Si; Si monocrystalline substrates; Si(100) substrates; annealing; high temperature X-ray diffraction; magnetic properties; nanostructural characterization; polarization investigations; Annealing; Copper; Magnetic multilayers; Magnetic properties; Nickel; Nonhomogeneous media; Substrates; Surface morphology; Surface topography; X-ray diffraction; high temperature X-ray diffraction; multilayers; nanostructured materials;

fLanguage

English

Publisher

ieee

Conference_Titel

MEMS, NANO, and Smart Systems (ICMENS), 2009 Fifth International Conference on

Conference_Location

Dubai

Print_ISBN

978-0-7695-3938-6

Electronic_ISBN

978-1-4244-5616-1

Type

conf

DOI

10.1109/ICMENS.2009.59

Filename

5489367