DocumentCode
271038
Title
Pitch scaling of ultrafast, optically-triggered silicon field emitter arrays
Author
Swanwick, M.E. ; Dong, Chen D. ; Keathley, P.D. ; Fallahi, Afshin ; Kartner, Franz X. ; Velasquez-GarciÌa, Luis Fernando
Author_Institution
Microsyst. Technol. Labs., Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear
2014
fDate
6-10 July 2014
Firstpage
69
Lastpage
70
Abstract
Ultrafast, optically-triggered field emitter arrays are an exciting new area of research with potential application in ultrafast imaging and in coherent x-ray sources based on inverse Compton scattering. The fabrication and preliminary experimental results of pitch scaling on emitter arrays using n-type silicon wafers and scalable CMOS processing is studied to better understand the effect of tip to tip field interaction, space charge and fabrication limitations.
Keywords
CMOS integrated circuits; Compton effect; field emitter arrays; high-speed optical techniques; scaling circuits; silicon; coherent X-ray sources; fabrication limitations; field interaction; inverse Compton scattering; n-type silicon wafers; pitch scaling; scalable CMOS processing; space charge; ultrafast imaging; ultrafast optically-triggered silicon field emitter arrays; Cathodes; Optical device fabrication; Optical imaging; Optical scattering; Silicon; Space charge; Stimulated emission; field emission; multiplexed field emisison cathodes; optical field emission; ultrafast; uniform arrays;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location
Engelberg
Print_ISBN
978-1-4799-5306-6
Type
conf
DOI
10.1109/IVNC.2014.6894763
Filename
6894763
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