• DocumentCode
    2713666
  • Title

    A collective relaxation model for resistance drift in phase change memory cells

  • Author

    Sebastian, Abu ; Krebs, Daniel ; Le Gallo, Manuel ; Pozidis, Haralampos ; Eleftheriou, Evangelos

  • Author_Institution
    IBM Res. - Zurich, Rüschlikon, Switzerland
  • fYear
    2015
  • fDate
    19-23 April 2015
  • Abstract
    Phase change memory (PCM) cells rely on the orders of magnitude difference in resistivity between the crystalline and amorphous phases to store information. However, the temporal evolution of the resistance of the amorphous phase, commonly referred to as resistance drift, is a key challenge for the realization of multi-level PCM. In this article, we present a comprehensive description of the time-temperature dependence of the resistance variation in a PCM cell. Our model consists of a structural relaxation model and an electrical transport model. The structural relaxation model is based on the idea that the atomic configuration of the melt-quenched amorphous phase as a whole collectively relaxes towards a more favorable equilibrium state. Experimental results obtained over a wide range of temperatures and times show remarkable agreement with the proposed model.
  • Keywords
    amorphous semiconductors; integrated circuit modelling; phase change memories; atomic configuration; collective relaxation model; crystalline phases; electrical transport model; equilibrium state; melt-quenched amorphous phase; multilevel PCM cells; phase change memory cells; resistance drift; resistance variation; structural relaxation model; time-temperature dependence; Annealing; Glass; Phase change materials; Programming; Resistance; Temperature distribution; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2015 IEEE International
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/IRPS.2015.7112808
  • Filename
    7112808