DocumentCode
2713666
Title
A collective relaxation model for resistance drift in phase change memory cells
Author
Sebastian, Abu ; Krebs, Daniel ; Le Gallo, Manuel ; Pozidis, Haralampos ; Eleftheriou, Evangelos
Author_Institution
IBM Res. - Zurich, Rüschlikon, Switzerland
fYear
2015
fDate
19-23 April 2015
Abstract
Phase change memory (PCM) cells rely on the orders of magnitude difference in resistivity between the crystalline and amorphous phases to store information. However, the temporal evolution of the resistance of the amorphous phase, commonly referred to as resistance drift, is a key challenge for the realization of multi-level PCM. In this article, we present a comprehensive description of the time-temperature dependence of the resistance variation in a PCM cell. Our model consists of a structural relaxation model and an electrical transport model. The structural relaxation model is based on the idea that the atomic configuration of the melt-quenched amorphous phase as a whole collectively relaxes towards a more favorable equilibrium state. Experimental results obtained over a wide range of temperatures and times show remarkable agreement with the proposed model.
Keywords
amorphous semiconductors; integrated circuit modelling; phase change memories; atomic configuration; collective relaxation model; crystalline phases; electrical transport model; equilibrium state; melt-quenched amorphous phase; multilevel PCM cells; phase change memory cells; resistance drift; resistance variation; structural relaxation model; time-temperature dependence; Annealing; Glass; Phase change materials; Programming; Resistance; Temperature distribution; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location
Monterey, CA
Type
conf
DOI
10.1109/IRPS.2015.7112808
Filename
7112808
Link To Document