Application of up-to-date materials and microelectronic technology in production of microwave and optical telecommunications equipment

Author

Demchenko, A.I. ; Khitko, V.I.

Author_Institution

Unitary Enterprise "Minsk SRI of Radiomaterials", Minsk, Belarus

fYear

2002

fDate

9-13 Sept. 2002

Firstpage

365

Lastpage

370

Abstract

Presented in this paper are the results of many years´ experience in the field of using different materials and microelectronic technologies for the production of microwave and optoelectronics devices for telecommunication equipment. Special attention is paid to A₃B₅ semiconductor materials and multilayer film structures as the basis of these devices. The experience of perspective ion technology applications is considered for the forming of microelectronic devices for microwave and optical wavebands.

Keywords

ion beam applications; microwave devices; microwave materials; multilayers; optical communication equipment; optical materials; optoelectronic devices; semiconductor technology; A₃B₅ semiconductor materials; ion technology; microelectronics technology; microwave device production; microwave/optoelectronic device materials; multilayer film structures; optical telecommunications equipment; Microelectronics; Microwave devices; Microwave technology; Nonhomogeneous media; Optical films; Optical materials; Optoelectronic devices; Production; Semiconductor films; Semiconductor materials;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave and Telecommunication Technology, 2002. CriMiCo 2002. 12th International Conference

Print_ISBN

966-7968-12-X

Type

conf

DOI

10.1109/CRMICO.2002.1137274

Filename

1137274