• DocumentCode
    2722641
  • Title

    Effects of on-chip decoupling capacitors and silicon substrate on power distribution networks in TSV-based 3D-ICs

  • Author

    Kim, Kiyeong ; Pak, Jun So ; Lee, Hyungdong ; Kim, Joungho

  • Author_Institution
    Dept. of Electr. Eng., KAIST, Daejeon, South Korea
  • fYear
    2012
  • fDate
    May 29 2012-June 1 2012
  • Firstpage
    690
  • Lastpage
    697
  • Abstract
    To analyze the effects of the on-chip decoupling capacitors (on-chip decaps) and silicon substrate on three-dimensional (3D) stacked on-chip power distribution networks (PDNs) in through silicon via (TSV)-based 3D-ICs, we propose a model for 3D stacked on-chip PDNs that includes the effects of the on-chip decaps and silicon substrate. The model is the RLGC-lumped model based on the segmentation method and scalable equations derived from physical configurations. The model is successfully validated by the 3D EM simulation using CST MWS up to 20 GHz. Using the proposed model, we analyze the effects of the on-chip decaps and silicon substrate on the impedance of 3D stacked on-chip PDNs with respect to variations in the capacitance and position of on-chip decaps, the conductivity of the silicon substrate, and the height between the on-chip PDN and silicon substrate.
  • Keywords
    capacitors; elemental semiconductors; integrated circuit modelling; microwave integrated circuits; silicon; three-dimensional integrated circuits; 3D EM simulation; 3D stacked on-chip PDN; CST MWS; RLGC-lumped model; Si; TSV-based 3D-IC; on-chip decaps; on-chip decoupling capacitor effects; physical configurations; segmentation method; silicon substrate; three-dimensional stacked on-chip power distribution networks; through silicon via-based integrated circuit; Capacitance; Impedance; Mathematical model; Silicon; Solid modeling; Substrates; System-on-a-chip;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4673-1966-9
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2012.6248907
  • Filename
    6248907