DocumentCode
2725886
Title
Electrical transport mechanism in VO2 thin films
Author
Golan, G. ; Axelevitch, A.
Author_Institution
Fac. of Eng., Holon Inst. of Technol. - HIT, Holon, Israel
fYear
2010
fDate
16-19 May 2010
Firstpage
141
Lastpage
144
Abstract
Vanadium oxide (VO2) transforms from a semiconductor phase to a metal phase at a temperature of 67°C. This phase transformation is accompanied by a dramatically change in its electrical and optical properties. Therefore, vanadium oxide thin films are very attractive for switching applications. This paper presents the optical and electrical properties of vanadium oxide thin films deposited by vacuum thermal evaporation of metallic vanadium following by oxidation. We have studied the electro-physical behavior of these VO2 films during their phase transition. It was shown that the electrical transport mechanism of the obtained vanadium oxide films differs in low and high electrical fields. In low electrical fields, conductivity is obtained by the Schottky transport mechanism, whereas in high electrical fields conductivity ranges from Ohmic mechanism for relatively low fields, to Poole-Frenkel mechanism for higher fields. FTIR and near IR reflectance characteristics of the obtained films are presented.
Keywords
Fourier transform spectra; Poole-Frenkel effect; Schottky effect; electrical conductivity transitions; infrared spectra; oxidation; thin films; vacuum deposition; vanadium compounds; FTIR spectra; Ohmic mechanism; Poole-Frenkel mechanism; Schottky transport; VO2; electrical conductivity; electrophysical properties; near IR reflectance spectra; oxidation; semiconductor-metal phase transformation; temperature 67 degC; vacuum thermal evaporation; vanadium oxide thin films; Conductivity; Electric variables measurement; Electrical resistance measurement; Optical films; Oxidation; Reflectivity; Semiconductor thin films; Substrates; Temperature; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics Proceedings (MIEL), 2010 27th International Conference on
Conference_Location
Nis
Print_ISBN
978-1-4244-7200-0
Type
conf
DOI
10.1109/MIEL.2010.5490513
Filename
5490513
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