DocumentCode
2729937
Title
Degradation of leakage currents in solid tantalum capacitors under steady-state bias conditions
Author
Teverovsky, Alexander
Author_Institution
Dell Perot Syst., GSFC/NASA, Greenbelt, MD, USA
fYear
2010
fDate
1-4 June 2010
Firstpage
752
Lastpage
757
Abstract
Degradation of leakage currents in various types of solid tantalum capacitors under steady-state bias conditions was investigated at temperatures from 105 °C to 170 °C and voltages up to two times the rated voltage. Variations of leakage currents with time under highly accelerated life testing (HALT) and annealing, thermally stimulated depolarization currents, and I-V characteristics were measured to understand the conduction mechanism and the reason for current degradation. During HALT the currents increase gradually up to three orders of magnitude in some cases, and then stabilize with time. This degradation is reversible and annealing can restore the initial levels of leakage currents. The results are attributed to migration of positively charged oxygen vacancies in tantalum pentoxide films that diminish the Schottky barrier at the MnO2/Ta2O5 interface and increase electron injection. A simple model allows for estimation of concentration and mobility of oxygen vacancies based on the level of current degradation.
Keywords
Annealing; Capacitors; Leakage current; Life estimation; Life testing; Solids; Steady-state; Temperature; Thermal degradation; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
Conference_Location
Las Vegas, NV, USA
ISSN
0569-5503
Print_ISBN
978-1-4244-6410-4
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2010.5490752
Filename
5490752
Link To Document