• DocumentCode
    2729937
  • Title

    Degradation of leakage currents in solid tantalum capacitors under steady-state bias conditions

  • Author

    Teverovsky, Alexander

  • Author_Institution
    Dell Perot Syst., GSFC/NASA, Greenbelt, MD, USA
  • fYear
    2010
  • fDate
    1-4 June 2010
  • Firstpage
    752
  • Lastpage
    757
  • Abstract
    Degradation of leakage currents in various types of solid tantalum capacitors under steady-state bias conditions was investigated at temperatures from 105 °C to 170 °C and voltages up to two times the rated voltage. Variations of leakage currents with time under highly accelerated life testing (HALT) and annealing, thermally stimulated depolarization currents, and I-V characteristics were measured to understand the conduction mechanism and the reason for current degradation. During HALT the currents increase gradually up to three orders of magnitude in some cases, and then stabilize with time. This degradation is reversible and annealing can restore the initial levels of leakage currents. The results are attributed to migration of positively charged oxygen vacancies in tantalum pentoxide films that diminish the Schottky barrier at the MnO2/Ta2O5 interface and increase electron injection. A simple model allows for estimation of concentration and mobility of oxygen vacancies based on the level of current degradation.
  • Keywords
    Annealing; Capacitors; Leakage current; Life estimation; Life testing; Solids; Steady-state; Temperature; Thermal degradation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-6410-4
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2010.5490752
  • Filename
    5490752