DocumentCode
2730312
Title
Multiple polynomial regression for modeling a MOSFET in saturation to validate the Early voltage
Author
Khan, Md Arafat Hossain ; Muntasir, Tanvir ; Rahman, A. S M Zahidur ; Acharjee, Uzzal Kumar ; Layek, Md Abu
Author_Institution
BUET, Dhaka, Bangladesh
fYear
2011
fDate
25-28 Sept. 2011
Firstpage
261
Lastpage
266
Abstract
Early voltage is indeed a very simple form of calculation for mathematical ease. But Channel Length Modulation is not actually linear. The non-linear Channel Length Modulation is in fact tells nothing strict about the Early voltage conception of MOSFET. For very short channel devices or thin oxide insulation, there arises lots of parameters which must be considered. The simulators uses lot more difficult equations to calculate the quantities. This paper deals with HSPICE, that uses hundreds of parameters to return the real world situation as it considers lots of non-ideal effects like- Non-uniform doping, Short channel DIBL effects, Narrow-width effect, Gate to substrate leakage, Bulk charge effect, Velocity saturation of intrinsic and extrinsic case, Drain induced threshold shift by pocket implant, Velocity overshoot, Flicker noise, Temperature dependence and a lot more complexities [1]. This paper describes the numerical approach to show whether the existing Early voltage approximation is valid for BSIM3 or BSIM4 MOSFET Model equations of HSPICE as they almost predict the real world situation. The most significant contribution of this paper is to propose a multiple polynomial regression method that can best approximate the Early voltage as well as the MOSFET characteristics in saturation.
Keywords
MOSFET; approximation theory; flicker noise; regression analysis; semiconductor device models; semiconductor device noise; semiconductor doping; BSIM3 MOSFET model equation; BSIM4 MOSFET model equation; HSPICE simulation; bulk charge effect; drain induced threshold shift; early voltage approximation; flicker noise; gate to substrate leakage; multiple polynomial regression method; narrow-width effect; nonlinear channel length modulation; nonuniform doping; pocket implant; short channel DIBL effect; short channel device; thin oxide insulation; velocity overshoot; velocity saturation; Curve fitting; Logic gates; MOSFET circuits; Mathematical model; Polynomials; Early voltage; HSPICE; MOSFET Saturation; MOSFET modeling; Multiple Polynomial Regression; channel length modulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Industrial Electronics and Applications (ISIEA), 2011 IEEE Symposium on
Conference_Location
Langkawi
Print_ISBN
978-1-4577-1418-4
Type
conf
DOI
10.1109/ISIEA.2011.6108712
Filename
6108712
Link To Document