• DocumentCode
    2734949
  • Title

    Estimate of the Power Dissipation of Multilayer and High Density Nano-CMOS Chip

  • Author

    Jiang, Li ; Zhou, Jie-Min ; Li, Chang-Geng

  • Author_Institution
    Sch. of Phys. Sci. & Technol., Central South Univ., Chang Sha
  • fYear
    2005
  • fDate
    27-29 June 2005
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    The structure model of the multilayer and high density nano-CMOS chip is described. Based on the power dissipation of nano-CMOS transistors, the fitting curve of the devices number of the chip device layer with average surface density of power dissipation, as concerns heat removed easily, the formula of power dissipation of multilayer and high density nano-CMOS chip is deduced. The power dissipation of a nano-CMOS transistor (Ptrt), a device layer (Pcl), and the chip (Pct) are estimated. The calculation results are reliable, and the conclusions of estimation contribute to the thermal design and the cooling of electronic package. In the design of the multilayer and high density CMOS chip, the maximum power dissipation layer is placed nearest heat sink is proposed. So far as soft design of the chip, the optimization of power dissipation should be considered under satisfying functions
  • Keywords
    CMOS integrated circuits; chip scale packaging; curve fitting; integrated circuit modelling; nanoelectronics; thermal management (packaging); electronic package cooling; fitting curve; heat sink; high density nano-CMOS chip; maximum power dissipation layer; multilayer chip; power dissipation estimation; thermal design; Circuits; Curve fitting; Electronic packaging thermal management; Electronics cooling; Insulation; Nanoscale devices; Nonhomogeneous media; Power dissipation; Surface fitting; Switches; Nano-CMOS device; fitting curve; power dissipation estimation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    0-7803-9292-2
  • Electronic_ISBN
    0-7803-9293-0
  • Type

    conf

  • DOI
    10.1109/HDP.2005.251420
  • Filename
    4017461