• DocumentCode
    2735091
  • Title

    Design and Fabrication of Micro-Compliant Amplifier with Topology Optimal Compliant Mechanism Integrated with a Piezoelectric Microactuator

  • Author

    Huang, Shyh-Chour ; Lan, Guh-Jyhjei

  • Author_Institution
    Dept. of Mech. Eng., Nat. Kaohsiung Univ. of Appl. Sci.
  • fYear
    2005
  • fDate
    27-29 June 2005
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    This paper describes the new way that using topology optimum compliant mechanism and PZT microactuator to design a large force and compliant amplifier mechanism. The common shorting of the microactuator devices is the relation of inverse ratio appears between the output force and output displacement. The mechanism uses the PZT microactuator to be the input and utilize the compliant mechanism to enhance the output displacement. This study uses the PZT microactuator that has 3000mum length, 2000mum width, 500mum thickness and analyses the different performance of microactuator with different applied voltages, width of beam and thickness. In the study, we define the compliant amplifier design domain as 4000mum times 5000mum, thickness as 500mum, and discuss the effect for different optimization parameters. The driving input is a PZT microactuator that can actuate about 6000muN output force to the displacement amplifier and consequently the device can generate about 28mum output displacement when two voltages are applied
  • Keywords
    amplifiers; microactuators; piezoelectric actuators; 2000 micron; 3000 micron; 4000 micron; 500 micron; 5000 micron; PZT microactuator; displacement amplifier; large force amplifier mechanism; microcompliant amplifier; piezoelectric microactuator; topology optimal compliant; Actuators; Design optimization; Fabrication; Microactuators; Micromechanical devices; Minimally invasive surgery; Optimization methods; Shape; Topology; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    0-7803-9292-2
  • Electronic_ISBN
    0-7803-9293-0
  • Type

    conf

  • DOI
    10.1109/HDP.2005.251431
  • Filename
    4017472