DocumentCode
2738491
Title
Electron Transport Across Interfaces in Horizontal Carbon Nanofiber Interconnects
Author
Yamada, T. ; Suzuki, M. ; Kitsuki, H. ; Saito, T. ; Fabris, D. ; Sun, X. ; Wilhite, P. ; Yang, C.Y.
Author_Institution
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
fYear
2008
fDate
18-21 Aug. 2008
Firstpage
263
Lastpage
266
Abstract
In a carbon nanofiber (CNF) metal contact such as a bridge between two metallic electrodes, passing high current (current stressing) reduces the total resistance of the system (CNF resistance RCNF and contact resistance Rc) by orders of magnitude. The role of current stressing is modeled as a reduction in the interfacial tunneling gap with transport characteristics attributed to tunneling between Au and CNF. The model predicts a reduction in Rc and the nonlinearity in the current-voltage (I-V) characteristics gradually disappears as Rc decreases. These results are consistent with I-V behavior measured experimentally.
Keywords
carbon fibres; contact resistance; gold; integrated circuit interconnections; nanostructured materials; semiconductor-metal boundaries; tunnelling; Au-C; carbon nanofiber-metal contact; contact resistance; current stressing; current-voltage characteristics; electron transport; horizontal carbon nanofiber interconnects; interfacial tunneling gap; metallic electrodes; Bridge circuits; Contact resistance; Current measurement; Electric breakdown; Electrical resistance measurement; Electrodes; Electrons; Gold; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location
Arlington, Texas
Print_ISBN
978-1-4244-2103-9
Electronic_ISBN
978-1-4244-2104-6
Type
conf
DOI
10.1109/NANO.2008.84
Filename
4617066
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