• DocumentCode
    2742936
  • Title

    Progress of SANYO´s R&D on thin film silicon solar module

  • Author

    Sekimoto, Takeyuki ; Katayama, Hirotaka ; Murata, Kazuya ; Matsumoto, Mitsuhiro ; Kitahara, Akinao ; Hishida, Mitsuoki ; Aya, Youichirou ; Shinohara, Wataru ; Nakagawa, Makoto ; Terakawa, Akira ; Tanaka, Makoto

  • Author_Institution
    Adv. Photovoltaics Dev. Center, SANYO Electr. Co., Ltd., Gifu, Japan
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    We have been developing original technologies for Localized Plasma Confinement (LPC) CVD method. LPC-CVD method achieves both a high deposition rate and a high conversion efficiency. From the results of IR analysis and Raman spectroscopy for μc-Si i-layer thin films, it was suggested that the combination of high stretching mode fractions in IR spectra and Raman crystallinity may have a correlation with the conversion efficiency of a-Si/μc-Si tandem cells. An R&D line for processing a-Si/μc-Si solar modules on G5.5 size glass substrates (1100 × 1400 mm2) has been constructed. Module efficiency of 11.1% (Initial) and 10.0% (Stable) has been achieved with a film deposition rate for the μc-Si i-layer of 2.4 nm/s on a G5.5 size substrate.
  • Keywords
    Raman spectroscopy; amorphous semiconductors; elemental semiconductors; infrared spectra; nanostructured materials; plasma CVD; plasma confinement; research and development; semiconductor thin films; silicon; solar cells; μc-Si i-layer thin film; IR spectra; LPC-CVD method; R&D; Raman spectroscopy; Sanyo; Si; a-Si; glass substrate; localized plasma confinement CVD method; mode fraction; tandem cell; thin film silicon solar module; Europe; Films; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5614744
  • Filename
    5614744