DocumentCode
2743014
Title
New printing pattern design and processing of MWT solar cells for pilot-line
Author
Chen, Sung-Yu ; Huang, Chao-Ping ; Chen, Bing-Cyun ; Wu, Der-Chin ; Hsu, Wei-Chih ; Du, Chen-Hsun
Author_Institution
Photovoltaics Technol. Center, Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear
2010
fDate
20-25 June 2010
Abstract
We present a feasible process for metal-wrap-through (MWT) solar cell with two-stage sintering. The main advantage of MWT solar cell is its larger illuminated area compare to those of conventional cells. Base on this, we design a new front side printing pattern which can optimize the current through each hole to achieve low series resistance and high fill factor. Besides, n layer is only located on the front surface owing to thin silicon nitride coating on the rear and via sidewall; so we don´t need to make isolation on edge and rear bus bar which would decrease fill factor and short-circuit current density. After the front Ag finger and rear Al metallization, we fill via holes and rear bus bar with the finger Ag paste. The deviation of cell efficiency is very large due to unstable non-firing via holes and bus bar resistivity but it can be improved dramatically from 1.2% to 0.1% after burning organic out by a controlling 400°C IR furnaces. The best cell efficiency is 16.6% on 270μm thick multi-crystalline silicon of 125×125 mm2 and the average efficiency is 16.5%.
Keywords
sintering; solar cells; MWT solar cells; bus bar resistivity; metal-wrap-through solar cell; pilot-line; printing pattern design; thin silicon nitride coating; two-stage sintering; unstable nonfiring via holes; Bars; Europe; Fingers; Photovoltaic cells; Printing; Resistance; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location
Honolulu, HI
ISSN
0160-8371
Print_ISBN
978-1-4244-5890-5
Type
conf
DOI
10.1109/PVSC.2010.5614749
Filename
5614749
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