• DocumentCode
    2746211
  • Title

    Parameter extractions and a new calibration methodology for MOSFET sensors

  • Author

    Tang, Chun-Pai ; Chung, Hsien ; Chao, Yung-Ching ; Lwo, Ben-Je

  • Author_Institution
    Semicond. Lab., Nat. Defense Univ., Tahsi
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    53
  • Lastpage
    56
  • Abstract
    In this work, we studied the availability of p-type MOSFET with 1 mum channel width and 0.15 mum channel length as a stress sensor. Under mechanical, thermal, and thermo-mechanical coupling effects, parameters of the MOSFET devices were extracted based on a new measurement methodology, and linear relationships between drain current variation and stress and/or thermal effects were obtained. According to the measurement data, the extremely important thermal effect was also noted. It is concluded in this work that the newly experimental design and the extracted parameters are useful for MOSFET stress sensor´s design and applications.
  • Keywords
    MOSFET; calibration; stress effects; thermomechanical treatment; MOSFET stress sensor; calibration methodology; drain current; p-type MOSFET; parameter extraction; size 0.15 mum; size 1 mum; stress effect; thermal effects; thermo-mechanical coupling effects; Calibration; Current measurement; Data mining; MOSFET circuits; Mechanical sensors; Mechanical variables measurement; Parameter extraction; Stress measurement; Thermal stresses; Thermomechanical processes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3620-0
  • Electronic_ISBN
    978-1-4244-3621-7
  • Type

    conf

  • DOI
    10.1109/EMAP.2008.4784227
  • Filename
    4784227