DocumentCode
2746756
Title
The role of Ni buffer layer between InSn solder and Cu metallization for hermetic wafer bonding
Author
Yu, Daquan ; Lee, Chengkuo ; Lau, John H.
Author_Institution
Inst. of Microelectron., Agency for Sci., Technol. & Res. (A*STAR), Singapore
fYear
2008
fDate
22-24 Oct. 2008
Firstpage
171
Lastpage
174
Abstract
In order to achieve low temperature hermetic sealing for MEMS and IC packaging, wafer-wafer bonding using In/Sn and Cu metallization system was investigated. We found that in order to get high bonding yield, a thin buffer layer between solder and Cu metallization is necessary except suitable bonding parameters. In this paper, diffusion phenomena between solders and metallization were studied, the conception of buffer layer for wafer eutectic wafer bonding was introduced, the effect of Ni thickness on the bonding and hermetic properties were reported.
Keywords
buffer layers; copper; diffusion; indium alloys; metallisation; nickel; solders; tin alloys; wafer bonding; IC packaging; InSn-Ni-Cu; buffer layer; diffusion; low temperature hermetic sealing; metallization; solders; wafer-eutectic wafer bonding; Buffer layers; Diffusion bonding; Gold; Metallization; Micromechanical devices; Packaging; Temperature; Tin; Wafer bonding; Wafer scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
Conference_Location
Taipei
Print_ISBN
978-1-4244-3620-0
Electronic_ISBN
978-1-4244-3621-7
Type
conf
DOI
10.1109/EMAP.2008.4784256
Filename
4784256
Link To Document