• DocumentCode
    2746756
  • Title

    The role of Ni buffer layer between InSn solder and Cu metallization for hermetic wafer bonding

  • Author

    Yu, Daquan ; Lee, Chengkuo ; Lau, John H.

  • Author_Institution
    Inst. of Microelectron., Agency for Sci., Technol. & Res. (A*STAR), Singapore
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    171
  • Lastpage
    174
  • Abstract
    In order to achieve low temperature hermetic sealing for MEMS and IC packaging, wafer-wafer bonding using In/Sn and Cu metallization system was investigated. We found that in order to get high bonding yield, a thin buffer layer between solder and Cu metallization is necessary except suitable bonding parameters. In this paper, diffusion phenomena between solders and metallization were studied, the conception of buffer layer for wafer eutectic wafer bonding was introduced, the effect of Ni thickness on the bonding and hermetic properties were reported.
  • Keywords
    buffer layers; copper; diffusion; indium alloys; metallisation; nickel; solders; tin alloys; wafer bonding; IC packaging; InSn-Ni-Cu; buffer layer; diffusion; low temperature hermetic sealing; metallization; solders; wafer-eutectic wafer bonding; Buffer layers; Diffusion bonding; Gold; Metallization; Micromechanical devices; Packaging; Temperature; Tin; Wafer bonding; Wafer scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3620-0
  • Electronic_ISBN
    978-1-4244-3621-7
  • Type

    conf

  • DOI
    10.1109/EMAP.2008.4784256
  • Filename
    4784256