DocumentCode
2746994
Title
Patent analysis for technology forecasting: Sector-specific applications
Author
Yoon, Byungun ; Lee, Sungjoo
Author_Institution
Dongguk Univ., Seoul
fYear
2008
fDate
28-30 June 2008
Firstpage
1
Lastpage
5
Abstract
Although patent analysis is a powerful technique to forecast the future of technology, it is not obvious whether the analysis is applicable to technology forecasting over all industries. Since the strategies of firms to protect their innovation vary among patents and trade secrets according to the characteristics of industries, patent analysis might be inappropriate to some industries. Therefore, this paper aims at improving the usefulness of patent analysis in TF by identifying relevant industries which the patent-based TF can be used in. To this end, first, sectoral differences in patenting activities will be investigated, presenting implications from patent activities, innovation patterns and patent statistics. Second, the applicability of patent trend analysis for technology forecasting will be explored in each industry by applying S-curve fitting with patent data. Finally, the method to improve the performance of patent-based TF will be suggested. The comparison of patent application status will make technology forecasting accurate, considering a time lag between R&D investment and patent application of the technology. This process will provide a good vehicle for precise TF by clarifying the application of patent analysis.
Keywords
innovation management; investment; patents; statistical analysis; technological forecasting; R&D investment; innovation; patent analysis; patent statistics; technology forecasting; Fitting; Intellectual property; Investments; Paper technology; Pattern analysis; Protection; Research and development; Statistics; Technological innovation; Technology forecasting; Patent analysis; S-curve; Sectoral patterns of innovation; Technology forecasting;
fLanguage
English
Publisher
ieee
Conference_Titel
Engineering Management Conference, 2008. IEMC Europe 2008. IEEE International
Conference_Location
Estoril
Print_ISBN
978-1-4244-2288-3
Electronic_ISBN
978-1-4244-2289-0
Type
conf
DOI
10.1109/IEMCE.2008.4617997
Filename
4617997
Link To Document