• DocumentCode
    2755457
  • Title

    Plasma torch device for micro-machining applications

  • Author

    Mostafa, O.A.

  • Author_Institution
    Dept. of Accel. & Ion Sources, Atomic Energy Authority, Cairo, Egypt
  • fYear
    1999
  • fDate
    23-25 Feb 1999
  • Abstract
    The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm2. N2, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6×10-4 torr
  • Keywords
    micromachining; plasma torches; sputter etching; 1.56 kV; 1.92 kV; 2.3 kV; 2.6E-4 torr; cathode target; coaxial floating cylinder; densities; discharge voltages; ion etching; mechanical confinement; micro-machining applications; plasma torch device; pressure; stainless steel anode rod; thinning; Anodes; Apertures; Cathodes; Coaxial components; Etching; Plasma applications; Plasma confinement; Plasma devices; Steel; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio Science Conference, 1999. NRSC '99. Proceedings of the Sixteenth National
  • Conference_Location
    Cairo
  • Print_ISBN
    977-5031-62-1
  • Type

    conf

  • DOI
    10.1109/NRSC.1999.760948
  • Filename
    760948