DocumentCode
2755457
Title
Plasma torch device for micro-machining applications
Author
Mostafa, O.A.
Author_Institution
Dept. of Accel. & Ion Sources, Atomic Energy Authority, Cairo, Egypt
fYear
1999
fDate
23-25 Feb 1999
Abstract
The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm2. N2, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6×10-4 torr
Keywords
micromachining; plasma torches; sputter etching; 1.56 kV; 1.92 kV; 2.3 kV; 2.6E-4 torr; cathode target; coaxial floating cylinder; densities; discharge voltages; ion etching; mechanical confinement; micro-machining applications; plasma torch device; pressure; stainless steel anode rod; thinning; Anodes; Apertures; Cathodes; Coaxial components; Etching; Plasma applications; Plasma confinement; Plasma devices; Steel; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Radio Science Conference, 1999. NRSC '99. Proceedings of the Sixteenth National
Conference_Location
Cairo
Print_ISBN
977-5031-62-1
Type
conf
DOI
10.1109/NRSC.1999.760948
Filename
760948
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