DocumentCode
2775320
Title
An asymmetric SRAM cell to lower gate leakage
Author
Azizi, Navid ; Najm, Farid N.
Author_Institution
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
fYear
2004
fDate
2004
Firstpage
534
Lastpage
539
Abstract
We introduce a new Static Random Access Memory (SRAM) cell that offers high stability and reduces gate leakage power in caches while maintaining low access latency. Our design exploits the strong bias towards zero at the bit level exhibited by the memory value stream of ordinary programs. Compared to conventional symmetric high-performance cell, our new cell reduces total leakage by more than 24% in the zero state at high temperature. With one cell design, total cache leakage is reduced by 24% at high temperature with no performance or stability loss. At low temperatures, where gate leakage is dominant, our cell reduces total cache leakage by 43%. We show that the new cell can be combined in an orthogonal fashion with asymmetric dual-Vt cells to lower both gate and subthreshold leakage, reducing total leakage by 45% to 60% with comparable performance and stability.
Keywords
SPICE; SRAM chips; cache storage; leakage currents; HSPICE simulation; asymmetric SRAM cell; high stability; low access latency; memory value stream; reduced gate leakage power; total cache leakage; CMOS technology; Gate leakage; MOSFETs; Power dissipation; Random access memory; Stability; Subthreshold current; Temperature; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design, 2004. Proceedings. 5th International Symposium on
Print_ISBN
0-7695-2093-6
Type
conf
DOI
10.1109/ISQED.2004.1283728
Filename
1283728
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