DocumentCode
2777353
Title
Coherent patterning of matter waves with subwavelength localization
Author
Mompart, J. ; Ahufinger, V. ; Birkl, G.
Author_Institution
Dept. de Fis., Univ. Autonoma de Barcelona, Bellaterra, Spain
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
In this work, the authors proposed a novel state selective atom localization and patterning scheme named subwavelength localization via adiabatic passage (SLAP) that consists in coupling two partially overlapping and spatially structured laser fields to three internal levels of the matter wave yielding state-selective localization at those positions where the adiabatic passage process does not occur. Compared to the coherent population trapping (CPT) based techniques, the SLAP technique presents several important advantages. The paper describes the SLAP technique to coherently achieve state-selective patterning and addressing of matter waves and analyze its potential implementation for nanolithography with an atomic beam of metastable Ne and for coherent patterning of a two-component 87Rb BEC.
Keywords
Bose-Einstein condensation; nanolithography; nanopatterning; neon; rubidium; Ne; Rb; atomic beam; coherent population trapping; matter wave coherent patterning; nanolithography; spatially structured laser; state selective atom localization; subwavelength localization; Atom lasers; Atomic beams; Dark states; Fabry-Perot; Matter waves; Optical coupling; Probes; Proposals; Spontaneous emission; Stationary state;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5191640
Filename
5191640
Link To Document