Advanced PECVD technology for manufacturing AM LCDs

Author

Tsai, Chuang-Chuang ; Shang, Quanyuan ; Takehara, Takako ; Harshbarger, William ; Law, Kam

Author_Institution

Appl. Komatsu Technol., Santa Clara, CA, USA

fYear

1999

fDate

1999

Firstpage

267

Lastpage

271

Abstract

PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiN_x, SiO₂, SiON, and n-Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper reviews the development of PECVD systems for volume manufacturing of LCDs and discusses process technology and requirements for future manufacturing

Keywords

amorphous semiconductors; crystallisation; elemental semiconductors; laser materials processing; liquid crystal displays; plasma CVD; reviews; semiconductor growth; silicon; silicon compounds; thin film transistors; AM LCDs; PECVD technology; Si; SiN; SiN_x; SiO₂; SiON; a-Si; a-Si precursor films; cluster tool configurations; flexible process flows; laser crystallization; low temperature deposition; n-Si films; polysilicon TFTs; process control; review; single substrate processing; volume manufacturing; Chemical technology; Flexible manufacturing systems; Liquid crystal displays; Manufacturing processes; Plasma displays; Plasma temperature; Process control; Productivity; Pulp manufacturing; Telephony;

fLanguage

English

Publisher

ieee

Conference_Titel

Information Display, 1999. ASID '99. Proceedings of the 5th Asian Symposium on

Conference_Location

Hsinchu

Print_ISBN

957-97347-9-8

Type

conf

DOI

10.1109/ASID.1999.762760

Filename

762760