DocumentCode
2786145
Title
Accuracy of single quantum dot registration using cryogenic laser photolithography
Author
Lee, K.H. ; Green, A.M. ; Taylor, R.A. ; Waldermann, F.C. ; Sena, A. ; Sharp, D.N. ; Turberfield, A.J. ; Brossard, F.S.F. ; Williams, D.A.
Author_Institution
Department of Physics, University of Oxford, Oxford, OX1 3PU, United Kingdom
Volume
2
fYear
2006
fDate
17-20 June 2006
Firstpage
723
Lastpage
726
Abstract
We have registered the position of single InGaAs quantum dots using a novel cryogenic laser photolithography technique. This would be useful in realizing solid state cavity quantum electrodynamics. By fabricating metal alignment markers around the quantum dot, it was registered with an accuracy of 50 nm. Following the marker fabrication process we demonstrated that the same quantum dot was reacquired, with an accuracy of 150 nm. The photoluminescence spectra from the quantum dots before and after processing were identical except for a small red shift (~1 nm), probably introduced during the reactive ion etching.
Keywords
Nanotechnology; Photoluminescence; Quantum effect semiconductor devices; Cryogenics; Electrodynamics; Etching; Indium gallium arsenide; Lithography; Optical device fabrication; Photoluminescence; Quantum dot lasers; Quantum dots; Solid state circuits; Nanotechnology; Photoluminescence; Quantum effect semiconductor devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN
1-4244-0077-5
Type
conf
DOI
10.1109/NANO.2006.247757
Filename
1717207
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