DocumentCode
2786179
Title
Modeling and fabrication of a photonic crystal based wavelength demultiplexer
Author
Tekeste, Meron Y. ; Yarrison-Rice, Jai M.
Author_Institution
Physics Department, Miami University, Miami University Center for Nanotechnology, Oxford, OH 45056
Volume
2
fYear
2006
fDate
17-20 June 2006
Firstpage
735
Lastpage
738
Abstract
A photonic crystal wavelength demultiplexer in the visible region is proposed. Fabrication results are presented. A triangular lattice of air holes in a silicon nitride background index photonic crystal slab is used in the modeling and fabrication process. A waveguide with a mirror at the other end and channels, which are coupled by a cavity with the waveguide, are incorporated to achieve a wavelength demultiplexer.
Keywords
Ebeam Lithography; Photonic crystal(PC); Silicon Nitride(Si; Wavelength demultiplexing (WDM); Couplings; Electrons; Etching; Fabrication; Lattices; Mirrors; Photonic band gap; Photonic crystals; Silicon; Wavelength division multiplexing; Ebeam Lithography; Photonic crystal(PC); Silicon Nitride(Si; Wavelength demultiplexing (WDM);
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN
1-4244-0077-5
Type
conf
DOI
10.1109/NANO.2006.247760
Filename
1717210
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