DocumentCode
2790592
Title
Practical anti-microbial surfaces on nylon and polyester by UV photochemistry
Author
Kelley, Michael J. ; Zhu, Zhengmao
Author_Institution
Jefferson Lab and College of William & Mary, Newport News VA, USA
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
1
Abstract
Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.
Keywords
Chemistry; Costs; Educational institutions; Influenza; Lead; Microwave integrated circuits; Nitrogen; Photochemistry; Polymers; Positron emission tomography;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location
Baltimore, MD, USA
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/QELS.2007.4431532
Filename
4431532
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