DocumentCode
2792221
Title
Design-manufacturing interface for 0.13 micron and below
Author
Strojwas, A.J.
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2000
fDate
5-9 Nov. 2000
Firstpage
575
Abstract
Summary form only given. This tutorial presents the requirements for the design-manufacturing interface in the upcoming generations of ULSI technologies. We start by presenting an overview of trends in the semiconductor industry: accelerated roadmap which leads to further miniaturization, the increasing role of manufacturing fluctuations, shrinking time to market, product complexity (including SOC) and the overall disaggregation of semiconductor industry (emergence of fabless companies and increasing role of foundries in manufacturing). Then we discuss the current, isolated approach to process development, product design and volume manufacturing. We conclude the tutorial by discussing the technical and organizational challenges that must be overcome to successfully implement this new design-manufacturing interface.
Keywords
ULSI; design for manufacture; electronics industry; ULSI; design-manufacturing interface; disaggregation; miniaturization; process development; product design; semiconductor industry; volume manufacturing; Acceleration; Electronics industry; Fluctuations; Lead compounds; Manufacturing processes; Product design; Semiconductor device manufacture; Time to market; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
Conference_Location
San Jose, CA, USA
ISSN
1092-3152
Print_ISBN
0-7803-6445-7
Type
conf
DOI
10.1109/ICCAD.2000.896534
Filename
896534
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