• DocumentCode
    2792221
  • Title

    Design-manufacturing interface for 0.13 micron and below

  • Author

    Strojwas, A.J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • fYear
    2000
  • fDate
    5-9 Nov. 2000
  • Firstpage
    575
  • Abstract
    Summary form only given. This tutorial presents the requirements for the design-manufacturing interface in the upcoming generations of ULSI technologies. We start by presenting an overview of trends in the semiconductor industry: accelerated roadmap which leads to further miniaturization, the increasing role of manufacturing fluctuations, shrinking time to market, product complexity (including SOC) and the overall disaggregation of semiconductor industry (emergence of fabless companies and increasing role of foundries in manufacturing). Then we discuss the current, isolated approach to process development, product design and volume manufacturing. We conclude the tutorial by discussing the technical and organizational challenges that must be overcome to successfully implement this new design-manufacturing interface.
  • Keywords
    ULSI; design for manufacture; electronics industry; ULSI; design-manufacturing interface; disaggregation; miniaturization; process development; product design; semiconductor industry; volume manufacturing; Acceleration; Electronics industry; Fluctuations; Lead compounds; Manufacturing processes; Product design; Semiconductor device manufacture; Time to market; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
  • Conference_Location
    San Jose, CA, USA
  • ISSN
    1092-3152
  • Print_ISBN
    0-7803-6445-7
  • Type

    conf

  • DOI
    10.1109/ICCAD.2000.896534
  • Filename
    896534