DocumentCode
2798773
Title
Transport mechanisms in SiO2 films with embedded Germanium nanoparticles
Author
Palade, Catalin ; Lepadatu, A. ; Stavarache, Ionel ; Maraloiu, Adrian V. ; Teodorescu, Valentin Serban ; Ciurea, Magdalena Lidia
Author_Institution
Nat. Inst. of Mater. Phys., Magurele, Romania
Volume
1
fYear
2012
fDate
15-17 Oct. 2012
Firstpage
91
Lastpage
94
Abstract
This paper reports on the conduction mechanisms in amorphous SiO2 films with embedded Ge nanoparticles. For this, measurements of current-temperature and current-voltage were employed and correlated with the microstructure results obtained from transmission electron microscopy (TEM). TEM images reveal that our films contain big Ge nanoparticles with low density and small Ge nanoparticles with high density, the last ones being the only responsible for the electrical transport. Two transport mechanisms were found at low and high temperature respectively, namely hopping on localized states in a band near Fermi level and charge excitation to the extended states at mobility edge.
Keywords
Fermi level; amorphous semiconductors; carrier mobility; conduction bands; hopping conduction; localised states; nanoparticles; semiconductor thin films; silicon compounds; transmission electron microscopy; Fermi level; SiO2-Ge; TEM; amorphous SiO2 films; charge excitation; conduction mechanisms; current-temperature measurements; current-voltage measurements; electrical transport; embedded Ge nanoparticles; extended states; hopping; localized states; microstructure; mobility edge; transmission electron microscopy; transport mechanisms; Conductivity; Films; Nanocrystals; Temperature; Temperature dependence; Temperature measurement; Conduction mechanisms; Magnetron sputtering; Nanoparticles; TEM;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference (CAS), 2012 International
Conference_Location
Sinaia
ISSN
1545-857X
Print_ISBN
978-1-4673-0737-6
Type
conf
DOI
10.1109/SMICND.2012.6400689
Filename
6400689
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