DocumentCode
2811977
Title
Microfabrication of vacuum compatible millimeter wave sources
Author
Sadwick, L. ; Hwu, R.J. ; Scheitrum, G.
Author_Institution
InnoSys Inc., Salt Lake City, UT, USA
fYear
2003
fDate
28-30 May 2003
Firstpage
360
Lastpage
361
Abstract
InnoSys is developing a fabrication techniques for manufacturing of millimeter wave vacuum electron devices from semiconductor manufacturing and micromachining. SU-8 RF circuits and PPM magnetic circuits are fabricated by LIGA methods. The circuit fabrication starts with a flat substrate and adds and removes material defined by lithographic masks. Fabricated circuits are integral parts of the vacuum envelope in millimeter wave devices.
Keywords
LIGA; magnetic circuits; masks; micromachining; millimetre wave circuits; photoresists; polymer films; vacuum microelectronics; LIGA; PPM magnetic circuits; SU-8 RF circuits; circuit fabrication; flat substrate; lithographic masks; microfabrication; micromachining; millimeter wave vacuum electron devices; semiconductor manufacturing; vacuum compatible millimeter wave sources; vacuum envelope; Electron devices; Fabrication; Magnetic circuits; Micromachining; Millimeter wave circuits; Millimeter wave devices; Millimeter wave technology; Radio frequency; Semiconductor device manufacture; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics, 2003 4th IEEE International Conference on
Print_ISBN
0-7803-7699-4
Type
conf
DOI
10.1109/IVEC.2003.1286391
Filename
1286391
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