Decomposition of fluorocarbon gaseous contaminants by surface discharge induced plasma chemical processing

Author

Oda, Tetsuji ; Takahashi, Tadashi ; Nakano, Hiroshi ; Masuda, Senichi

Author_Institution

Fac. of Eng., Tokyo Univ., Japan

fYear

1991

fDate

Sept. 28 1991-Oct. 4 1991

Firstpage

734

Abstract

Surface discharge induced plasma chemical processing (SPCP) using a high-grade alumina-based cylindrical reactor with an embedded ground electrode and stripe-shaped surface metal electrodes was applied to decompose chlorofluorocarbon contaminants in air, nitrogen, and oxygen. A very high decomposition rate, more than 99%, was observed for 100 or 1000 p.p.m. CFC-113. Greater electric power is found to be necessary to decompose the chemically stable fluorocarbon, but a substantial further improvement of efficiency will be possible in the near future. The authors feel that this system will be effective to decompose dilute fluorocarbon in large quantities.<>

Keywords

air pollution detection and control; electric breakdown of gases; electrodes; electrostatic devices; electrostatics; surface discharges; Al/sub 2/O/sub 3/; CFC-113; cylindrical reactor; decomposition; efficiency; electrostatic devices; embedded ground electrode; fluorocarbon gaseous contaminants; pollution control; surface discharge induced plasma chemical processing; Ceramics; Chemical processes; Chemical technology; Inductors; Nitrogen; Plasma chemistry; Plasma materials processing; Surface contamination; Surface discharges; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Industry Applications Society Annual Meeting, 1991., Conference Record of the 1991 IEEE

Conference_Location

Dearborn, MI, USA

Print_ISBN

0-7803-0453-5

Type

conf

DOI

10.1109/IAS.1991.178320

Filename

178320