• DocumentCode
    2853269
  • Title

    Resonant Body Transistors in IBM´s 32nm SOI CMOS technology

  • Author

    Marathe, Radhika ; Wang, W. ; Mahmood, Zohaib ; Daniel, Luca ; Weinstein, D.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2012
  • fDate
    1-4 Oct. 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    This work presents an unreleased CMOS-integrated MEMS resonators fabricated at the transistor level of IBM´s 32SOI technology and realized without the need for any post-processing or packaging. These Resonant Body Transistors (RBTs) are driven capacitively and sensed piezoresistively using an n-channel Field Effect Transistor (nFET). Acoustic Bragg Reflectors (ABRs) are used to localize acoustic vibrations in these resonators completely buried in the CMOS stack and surrounded by low-k dielectric. Experimental results from the first generation hybrid CMOS-MEMS show RBTs operating at 11.1-11.5 GHz with footprints <; 5μm × 3μm. The response of active resonators is shown to contrast with passive resonators showing no discernible peak. Comparative behavior of devices with design variations is used to demonstrate the effect of ABRs on spurious mode suppression. Temperature stability and TCF compensation due to complimentary materials in the CMOS stack are experimentally verified.
  • Keywords
    CMOS integrated circuits; MOSFET; compensation; field effect MMIC; low-k dielectric thin films; microfabrication; micromechanical resonators; piezoresistive devices; silicon-on-insulator; ABR; CMOS stack; IBM SOI CMOS technology; RBT; TCF compensation; acoustic Bragg reflectors; acoustic vibrations; active resonator response; first generation hybrid CMOS-MEMS; frequency 11.1 GHz to 11.5 GHz; low-k dielectric; n-channel field effect transistor; nFET; passive resonators; resonant body transistors; size 32 nm; spurious mode suppression; temperature stability; transistor level; unreleased CMOS-integrated MEMS resonators; CMOS integrated circuits; Resonant frequency; Sensors; Silicon; Temperature measurement; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2012 IEEE International
  • Conference_Location
    NAPA, CA
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-4673-2690-2
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2012.6404400
  • Filename
    6404400