DocumentCode
2857626
Title
Integration of III-V materials on silicon substrates for multi-junction solar cell applications
Author
García-Tabarés, E. ; García, I. ; Rey-Stolle, I. ; Algora, C. ; Martín, D.
Author_Institution
E.T.S.I. Telecomun., Inst. de Energia Solar (UPM), Madrid, Spain
fYear
2011
fDate
8-11 Feb. 2011
Firstpage
1
Lastpage
4
Abstract
The work presented here aims to reduce the cost of multijunction solar cell technology by developing ways to manufacture them on cheap substrates such as silicon. In particular, our main objective is the growth of III-V semiconductors on silicon substrates for photovoltaic applications. The goal is to create a GaAsP/Si virtual substrates onto which other III-V cells could be integrated with an interesting efficiency potential. This technology involves several challenges due to the difficulty of growing III-V materials on silicon. In this paper, our first work done aimed at developing such structure is presented. It was focused on the development of phosphorus diffusion models on silicon and on the preparation of an optimal silicon surface to grow on it III-V materials.
Keywords
III-V semiconductors; MOCVD; diffusion; gallium arsenide; semiconductor growth; solar cells; GaAsP-Si; III-V cell; III-V material integration; III-V semiconductor; cheap substrates; cost reduction; multijunction solar cell application; optimal silicon surface preparation; phosphorus diffusion model; photovoltaic application; silicon substrates; virtual substrates; Epitaxial growth; Epitaxial layers; Photonic band gap; Photovoltaic cells; Silicon; Substrates; III/V on Si heteroepitaxy; Metal-Organic Vapor Phase Epitaxy (MOVPE); metamorphic; multi-junction solar cell;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices (CDE), 2011 Spanish Conference on
Conference_Location
Palma de Mallorca
Print_ISBN
978-1-4244-7863-7
Type
conf
DOI
10.1109/SCED.2011.5744190
Filename
5744190
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