• DocumentCode
    2864859
  • Title

    F2 laser patterning indium tin oxide (ITO) thin film coating on glass substrates

  • Author

    Xu, M.Y. ; Lilge, L.D. ; Herman, P.R.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON
  • fYear
    2006
  • fDate
    21-26 May 2006
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The first experimental results of machining indium tin oxide thin films with the 157 nm F2 laser are reported. A low 0.27-J/cm2 ablation threshold and stoichiometric removal enable electrode patterning for biochip applications.
  • Keywords
    fluorine; glass; indium compounds; laser beam machining; laser materials processing; optical films; F2 laser patterning; ITO; ablation threshold; biochip applications; electrode patterning; glass substrates; indium tin oxide; machining; stoichiometric removal; thin film coating; wavelength 157 nm; Atomic force microscopy; Coatings; Etching; Indium tin oxide; Laser ablation; Laser modes; Optical films; Optical microscopy; Scanning electron microscopy; Surface morphology; (310.3840) Materials and process characterization; (310.6870) Thin films, other properties;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
  • Conference_Location
    Long Beach, CA
  • Print_ISBN
    978-1-55752-813-1
  • Electronic_ISBN
    978-1-55752-813-1
  • Type

    conf

  • DOI
    10.1109/CLEO.2006.4627850
  • Filename
    4627850
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2864859