DocumentCode
2865586
Title
Diffractive optical elements based fabrication of photonic crystals
Author
Chanda, Debashis ; Abolghasemi, Ladan ; Herman, Peter R.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
Using double exposure of 1D diffractive optical elements, three-dimensional woodpile-type photonic crystal structures have been fabricated in photosensitive materials with the 488 nm Ar+ laser. Photonic stopband was observed at 4.45 mum band.
Keywords
argon; diffractive optical elements; photonic crystals; 1D diffractive optical elements; 3D woodpile-type; Ar+; double exposure; photonic crystal structures; photosensitive materials; wavelength 488 nm; Holographic optical components; Holography; Interference; Lithography; Optical device fabrication; Optical diffraction; Optical sensors; Photonic crystals; Resists; US Department of Energy; (090.0090) Holography; (110.5220) Photolithography; (220.4000) Microstructure fabrication; (260.3160) Interference;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4627892
Filename
4627892
Link To Document