DocumentCode
2866321
Title
Yield and equipment utilization improvements achieved through fab conversion to carbon fiber/PEEK wafer carriers and carbon fiber/polypropylene storage boxes
Author
Merrill, Ed ; Bostwick, Jim ; Gilhoi, Chad ; Mikkelsen, Kirk
Author_Institution
IBM Microelectron. Div., Essex Jct., VT, USA
fYear
2000
fDate
2000
Firstpage
41
Lastpage
45
Abstract
Many semiconductor fabs using outdated wafer carrier technology are facing problems with carrier dimensional variation over time and particle generation. Carrier dimensional variation leads to excessive tool failures and wafer damage. This results in decreased throughput and yield loss. In addition, carrier particulation directly causes wafer defects, also negatively affecting yield. IBM-Burlington was encountering these problems and put a great deal of effort toward estimating yield loss and obtaining financial support to upgrade the carriers. After financial support was obtained, a customer/supplier team was formed to plan the conversion to an upgraded carrier and box. Significant improvements in yield and tool availability were realized with minimal impact on production during conversion
Keywords
filled polymers; integrated circuit yield; manufacturing resources planning; materials handling; C; carbon fiber/PEEK wafer carriers; carbon powder/polypropylene storage boxes; carrier dimensional variation; equipment utilization improvement; particle generation; semiconductor fabs; throughput; tool failures; wafer damage; wafer defects; yield loss; yield utilization improvements; Calibration; Character generation; Material storage; Optical fiber devices; Postal services; Production; Rivers; Surface resistance; Throughput; Yield estimation;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5921-6
Type
conf
DOI
10.1109/ASMC.2000.902556
Filename
902556
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