Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

Author

Yun, Kwang-Seok ; Yoon, Euisik

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea

fYear

2004

fDate

2004

Firstpage

757

Lastpage

760

Abstract

This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.

Keywords

microfluidics; photoresists; polymer films; 3 dimensional photoresist structures; PDMS microfluidic components; UV-insensitive sacrificial photoresist; cantilevers; microfabrication; micromaster molds; micromechanical devices; micropits; patterning; photolithography; Application software; Bridges; Glass; Lithography; Microfluidics; Resists; Shape; Stacking; Telephony; Wafer bonding;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

Print_ISBN

0-7803-8265-X

Type

conf

DOI

10.1109/MEMS.2004.1290695

Filename

1290695