DocumentCode
2880033
Title
Ultra-thin Die Characterization for Stack-die Packaging
Author
Sun, Wei ; Zhu, W.H. ; Che, F.X. ; Wang, C.K. ; Sun, Anthony Y S ; Tan, H.B.
Author_Institution
United Test & Assembly Center Ltd, Singapore
fYear
2007
fDate
May 29 2007-June 1 2007
Firstpage
1390
Lastpage
1396
Abstract
On both the process side and the reliability side, the mechanical strength of ultra-thin die is critical to ensure high assembly yield and good package reliability. To understand the mechanical strength and characteristics of ultra-thin die, comprehensive characterization work must be conducted. The current paper details the various ultra-thin die/wafer characterization and optimization work done by UTAC, where wafer is thinned down to 75 mum and 50 mum for stack-die application. At the wafer level, characterization tools like FSM´s laser based system and atomic force microscopy (AFM) were used to measure the finished wafer thickness, total thickness variation (TTV) and roughness. Two important dry polishing process parameters, namely applied load and stroke time, were investigated to understand their effects on those wafer characteristics. Subsequently, various types of dry polished wafers were diced into individual dies for die strength characterization study. Three test configurations, 3-point bending, 4-point bending and ring-on-ring, were used. Again, effect of dry polishing parameters on die strength was studied. Efforts were also paid to correlate die strength with wafer back surface roughness and finished wafer thickness.
Keywords
atomic force microscopy; integrated circuit packaging; integrated circuit reliability; integrated circuit testing; integrated circuit yield; measurement by laser beam; mechanical strength; polishing; surface roughness; surface topography measurement; thickness measurement; AFM; assembly yield; atomic force microscopy; dry polishing process parameters; laser based system; mechanical strength; package reliability; size 50 mum; size 75 mum; stack-die packaging; surface roughness; ultra-thin die characterization; wafer characterization; Assembly; Atom lasers; Atomic beams; Atomic force microscopy; Atomic measurements; Force measurement; Packaging; Rough surfaces; Testing; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
Conference_Location
Reno, NV
ISSN
0569-5503
Print_ISBN
1-4244-0985-3
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2007.373976
Filename
4250062
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