• DocumentCode
    2891408
  • Title

    A deep level reasoning tool for semiconductor process simulation

  • Author

    Slaughter, Stephen ; Hartzell, Robert ; Chang, Tai-Chun

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1989
  • fDate
    22-24 May 1989
  • Firstpage
    117
  • Abstract
    Summary form only given. An approach is proposed which attempts to combine features found in traditional process simulators and expert systems. The result is a system which generates process-specific knowledge from physical models by the sequential execution of a process recipe. This deep-level knowledge can be used in conjunction with techniques borrowed from the artificial intelligence community to reason about a variety of domain problems. Dependency trees are generated by the sequential execution of a process recipe. These trees can be used for identifying relationships between process steps and structures, which is useful in a problem-solving domain. The system design has been optimized for speed by using both analytical and empirical models. Typical recipes can be simulated in approximately one minute. Accuracy is achieved by providing a tuning mechanism which allows the user to input actual process data as a goal for the system output. The program described offers a logical evolution over traditional simulators and should find future applications in process control and failure analysis
  • Keywords
    digital simulation; electronic engineering computing; expert systems; failure analysis; inference mechanisms; integrated circuit manufacture; process control; semiconductor device manufacture; deep level reasoning tool; dependency trees generation; expert systems; failure analysis; physical models; process control; process recipe; process-specific knowledge; semiconductor process simulation; sequential execution; Analytical models; Artificial intelligence; Design optimization; Expert systems; Instruments; Manufacturing processes; Problem-solving; Semiconductor device manufacture; Semiconductor process modeling; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Science Symposium, 1989. ISMSS 1989., IEEE/SEMI International
  • Conference_Location
    Burlingame, CA
  • Type

    conf

  • DOI
    10.1109/ISMSS.1989.77258
  • Filename
    77258