• DocumentCode
    2897540
  • Title

    Double face two-dimensional domain engineering in congruent lithium niobate

  • Author

    Grilli, Simonetta ; Ferraro, Pietro ; Sansone, Lucia ; Paturzo, Melania ; De Nicola, Sergio ; Finizio, Andrea ; Pierattini, Giovanni ; De Natale, Paolo

  • Author_Institution
    Ist. Nazionale di Ottica Applicata, Florence, Italy
  • fYear
    2005
  • fDate
    12-17 June 2005
  • Firstpage
    267
  • Abstract
    In this work, a technique for achieving double face, sub-micron and 2-D reversed domain patterns is proposed, in congruent r-cut LN crystals. This technique is based on resist patterning the samples by interference photolithography followed by an electric field overpoling process.
  • Keywords
    lithium compounds; optical materials; photolithography; LiNbO3; congruent r-cut lithium niobate crystal; double face two-dimensional domain engineering; electric field overpoling process; interference photolithography; resist patterning; sub-micron 2-D reversed domain patterns; Crystals; Ferroelectric materials; Frequency conversion; Interference; Lithium niobate; Lithography; Nonlinear optics; Optical harmonic generation; Optical modulation; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
  • Print_ISBN
    0-7803-8974-3
  • Type

    conf

  • DOI
    10.1109/CLEOE.2005.1568052
  • Filename
    1568052
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2897540