Counter streaming beams model in MICHELLE eBEAM

Simulation of counter streaming charged particle beams, where two beams are co-located in space while propagating in opposite directions, has many applications ranging from the lower current electron beam lithography regime to the higher current Free Electron Laser (FEL) regime. Modeling such counter streaming beams presents different computational challenges depending on the specific device being modeled. Applications of interest require in some cases the model of both global and stochastic space charge; the latter requires direct evaluation of Coulomb interactions. A new approach implemented in MICHELLE-eBEAM is designed to take advantage of the GPU hardware acceleration and novel algorithms to capture such inter-particle interactions efficiently. In this paper we report on our latest progress and show for a high current electron beam lithography application the achieved accuracy and performance of the new code.