• DocumentCode
    2899287
  • Title

    C45 ultra low k wafer technology with Cu wire bonding

  • Author

    Leng, Eu Poh ; Siong, Chin Teik ; Seong, Lee Boon ; Leong, Philip ; Gunasekaran ; Song, James ; Mock, K.S. ; Siew, C.W. ; Sivakumar ; Kid, Wong Boh ; Weily, Chew

  • Author_Institution
    Freescale Semicond. (M) Sdn. Bhd., Petaling Jaya, Malaysia
  • fYear
    2010
  • fDate
    Nov. 30 2010-Dec. 2 2010
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    As gold price continues to move in an overall rising trend, conversion to Cu wire has been given great focus as the main effort for cost reduction. Cu is a good alternative due to 26% lower electrical resistivity than Au, hence much higher electrical conductivity. However, Cu free-air-ball and bonded ball hardness are 34% and 60% higher than that of Au, hence increases the stress on bond pad and chip. Although Cu wire price is generally only 5 to 10% of Au wire cost depending on wire diameter, but bonding with a much harder material like Cu requires great characterization effort due to the a much higher level of unknowns and complexities, especially when dealing with ultra fine pitch and ultra low k wafer technology.
  • Keywords
    ball grid arrays; copper; lead bonding; palladium; wafer bonding; wafer level packaging; BGA; Cu; DOE process; FAB oxidation; Pd; bond pad peeling; bond peel strength; bonded ball hardness; bonding parameters optimization; capillary selection; copper free-air-ball hardness; copper wire bonding; electrical conductivity; electrical resistivity; semiconductor industry; temperature 175 C; thermal aging testing; time 168 hour; wafer technology; wire selection process; Copper; Gold; Robustness; Substrates; US Department of Energy; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium (IEMT), 2010 34th IEEE/CPMT International
  • Conference_Location
    Melaka
  • ISSN
    1089-8190
  • Print_ISBN
    978-1-4244-8825-4
  • Type

    conf

  • DOI
    10.1109/IEMT.2010.5746739
  • Filename
    5746739