• DocumentCode
    2899395
  • Title

    Accurate determination of CMOS capacitance parameters using multilayer structures

  • Author

    De Lange, Willem

  • Author_Institution
    Intergraph Corp., Palo Alto, CA, USA
  • fYear
    1992
  • fDate
    16-19 Mar 1992
  • Firstpage
    57
  • Lastpage
    61
  • Abstract
    Focuses on the principles and experimental results of accurately measuring very small capacitances on a CMOS integrated circuit. An important feature is that stray capacitance to ground, on either or both nodes of the capacitor, does not alter the measured capacitance value. This allows integration of many relevant design features in small multilayer test structures. The author also presents an implementation of this method in a circuit that accurately extracts the capacitance between stacked layers and fringing capacitance between adjacent signal leads
  • Keywords
    CMOS integrated circuits; capacitance measurement; integrated circuit testing; CMOS capacitance parameters; adjacent signal leads; design features; fringing capacitance; measured capacitance value; multilayer structures; stacked layers; stray capacitance; test structures; CMOS integrated circuits; Capacitance measurement; Capacitors; Circuit testing; Integrated circuit measurements; Nonhomogeneous media; Parasitic capacitance; Switches; Variable structure systems; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1992. ICMTS 1992. Proceedings of the 1992 International Conference on
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    0-7803-0535-3
  • Type

    conf

  • DOI
    10.1109/ICMTS.1992.185938
  • Filename
    185938