• DocumentCode
    2907678
  • Title

    Properties of fully self-aligned InAlAs/InGaAs PNP HBTs with very thin bases

  • Author

    Sawdai, D. ; Zhang, X. ; Cui, D. ; Pavlidis, D. ; Bhattacharya, P.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    187
  • Lastpage
    190
  • Abstract
    For the first time, the effect of base thickness and parasitic collector resistance on InP-based PNP HBTs was determined experimentally. HBTs with 350-Å and 900-Å base layers and self-aligned collector contacts demonstrated DC gain of 21.3 and 5.9, f T of 18.6 and 8.5 GHz, and fmax of 27.3 and 20.8 GHz, respectively. This is the highest fT reported for any InP-based PNP HBT. Analysis of these HBTs demonstrated that recombination of holes in the neutral base limited the DC gain, and hole transit across the base was the most significant component of τec. In addition, comparison of HBTs with and without self-aligned collectors demonstrated that collector series resistance had a minor but noticeable impact on fT as well as the gain and power-added efficiency at 8 GHz
  • Keywords
    III-V semiconductors; aluminium compounds; electrical resistivity; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; semiconductor device measurement; 20.8 GHz; 350 A; 8 GHz; 8.5 GHz; 900 A; DC gain; InAlAs-InGaAs-InP; InP-based PNP HBTs; base thickness; collector series resistance; fully self-aligned InAlAs/InGaAs PNP HBTs; hole recombination; hole transit; parasitic collector resistance; power-added efficiency; self-aligned collector contacts; thin bases; Contact resistance; Electric resistance; Etching; Fabrication; Gold; Heterojunction bipolar transistors; Indium compounds; Indium gallium arsenide; Metallization; Power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
  • Conference_Location
    Davos
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-5562-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1999.773665
  • Filename
    773665