• DocumentCode
    2917303
  • Title

    Identifying degradation mechanisms in RF MEMS capacitive switches

  • Author

    Herfst, R.W. ; Steeneken, P.G. ; Schmitz, J.

  • Author_Institution
    NXP Semicond. / Corp. I&T / Res., Eindhoven
  • fYear
    2008
  • fDate
    13-17 Jan. 2008
  • Firstpage
    168
  • Lastpage
    171
  • Abstract
    In this paper we demonstrate how different degradation mechanisms of RF MEMS capacitive switches can be identified by carefully examining changes in key aspects of the measured C-V curves. We show that C-V curve narrowing can occur either due to mechanical deformation or to laterally inhomogeneous dielectric charging. We also show how these two degradation mechanisms can be distinguished by monitoring the change in the pull-in and pull-out voltages. Our measurements indicate that both degradation mechanisms do indeed occur in practice, depending on the stress conditions.
  • Keywords
    deformation; microswitches; C-V curve; RF MEMS capacitive switches; degradation mechanisms; laterally inhomogeneous dielectric charging; mechanical deformation; Capacitance-voltage characteristics; Degradation; Dielectric measurements; Electrodes; Electrostatics; Radiofrequency identification; Radiofrequency microelectromechanical systems; Springs; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
  • Conference_Location
    Tucson, AZ
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-1792-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2008.4443619
  • Filename
    4443619