DocumentCode
2917303
Title
Identifying degradation mechanisms in RF MEMS capacitive switches
Author
Herfst, R.W. ; Steeneken, P.G. ; Schmitz, J.
Author_Institution
NXP Semicond. / Corp. I&T / Res., Eindhoven
fYear
2008
fDate
13-17 Jan. 2008
Firstpage
168
Lastpage
171
Abstract
In this paper we demonstrate how different degradation mechanisms of RF MEMS capacitive switches can be identified by carefully examining changes in key aspects of the measured C-V curves. We show that C-V curve narrowing can occur either due to mechanical deformation or to laterally inhomogeneous dielectric charging. We also show how these two degradation mechanisms can be distinguished by monitoring the change in the pull-in and pull-out voltages. Our measurements indicate that both degradation mechanisms do indeed occur in practice, depending on the stress conditions.
Keywords
deformation; microswitches; C-V curve; RF MEMS capacitive switches; degradation mechanisms; laterally inhomogeneous dielectric charging; mechanical deformation; Capacitance-voltage characteristics; Degradation; Dielectric measurements; Electrodes; Electrostatics; Radiofrequency identification; Radiofrequency microelectromechanical systems; Springs; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location
Tucson, AZ
ISSN
1084-6999
Print_ISBN
978-1-4244-1792-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2008.4443619
Filename
4443619
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