• DocumentCode
    2922397
  • Title

    Coupled Approach for Reliability Study of Fully Self Aligned SiGe: C 250GHz HBTs

  • Author

    Diop, Malick ; Revil, N. ; Marin, Mathieu ; Monsieur, Frédéric ; Schwartzmann, Thierry ; Ghibaudo, Gérard

  • Author_Institution
    STMicroelectronics, Crolles
  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    77
  • Lastpage
    80
  • Abstract
    High performance bipolar transistors were investigated under both reverse and forward stress conditions. Although classical hot-carrier induced degradation has been shown in reverse mode, the results obtained under forward conditions were not in line with those reported for previous device generation. Indeed, the coupled approach using low frequency noise spectra measurements and reliability studies show a relaxation of the pre-existing and/or created defects during stress. Moreover, coexistence of both classical Shockley-Read-Hall recombination and unusual trap-assisted tunnelling is clearly demonstrated and confirmed by TCAD simulations.
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; millimetre wave couplers; millimetre wave transistors; semiconductor device measurement; semiconductor device noise; semiconductor device reliability; HBT; SiGe:C; device generation; device stress defects; frequency 250 GHz; high performance bipolar transistors; low frequency noise spectra measurements; reliability studies; Bipolar transistors; Degradation; Frequency measurement; Germanium silicon alloys; Hot carriers; Low-frequency noise; Noise measurement; Silicon germanium; Stress measurement; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
  • Conference_Location
    S. Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-2194-7
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2008.4796091
  • Filename
    4796091