DocumentCode
2922397
Title
Coupled Approach for Reliability Study of Fully Self Aligned SiGe: C 250GHz HBTs
Author
Diop, Malick ; Revil, N. ; Marin, Mathieu ; Monsieur, Frédéric ; Schwartzmann, Thierry ; Ghibaudo, Gérard
Author_Institution
STMicroelectronics, Crolles
fYear
2008
fDate
12-16 Oct. 2008
Firstpage
77
Lastpage
80
Abstract
High performance bipolar transistors were investigated under both reverse and forward stress conditions. Although classical hot-carrier induced degradation has been shown in reverse mode, the results obtained under forward conditions were not in line with those reported for previous device generation. Indeed, the coupled approach using low frequency noise spectra measurements and reliability studies show a relaxation of the pre-existing and/or created defects during stress. Moreover, coexistence of both classical Shockley-Read-Hall recombination and unusual trap-assisted tunnelling is clearly demonstrated and confirmed by TCAD simulations.
Keywords
Ge-Si alloys; heterojunction bipolar transistors; millimetre wave couplers; millimetre wave transistors; semiconductor device measurement; semiconductor device noise; semiconductor device reliability; HBT; SiGe:C; device generation; device stress defects; frequency 250 GHz; high performance bipolar transistors; low frequency noise spectra measurements; reliability studies; Bipolar transistors; Degradation; Frequency measurement; Germanium silicon alloys; Hot carriers; Low-frequency noise; Noise measurement; Silicon germanium; Stress measurement; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-2194-7
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2008.4796091
Filename
4796091
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