• DocumentCode
    2925844
  • Title

    P4-19: Tracing backscattered electrons in full energy range

  • Author

    Munro, Eric ; Rouse, John ; Zhu, Xieqing ; Katsap, Victor

  • Author_Institution
    Munro´´s Electron Beam Software Ltd., London, UK
  • fYear
    2010
  • fDate
    18-20 May 2010
  • Firstpage
    483
  • Lastpage
    484
  • Abstract
    It is critically important to know backscattered electron (BSE) trajectories and current density in electron beam lithography tools, where a 50 keV electron beam is incident upon the target plane. The space near the target plane is occupied by closely-spaced optical components and sensors, all prone to surface charging. We have reported previously the results of testing SOURCEBS rev.1.0, a software for tracing BSE´s of known energy value. Recently, we have developed SOURCEBS rev. 4.0. This software takes the full spectrum of BSE energies and initial coordinates from MONSEL, an electron-solid state modeling software program. SOURCEBS rev. 4.0 traces BSE´s with their full energy spectrum in electrostatic and magnetic fields, and computes the BSE current density at user-chosen surfaces.
  • Keywords
    electron backscattering; electron beam lithography; MONSEL; SOURCEBS rev.1.0; backscattered electrons; closely-spaced optical components; current density; electron beam lithography; electron-solid state modeling software; sensors; surface charging; Current density; Electron beams; Electrostatics; Lithography; Optical devices; Optical sensors; Software testing; Space charge; Surface charging; Trajectory; backscattered electrons; e-beam lithography; energy distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference (IVEC), 2010 IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-7098-3
  • Type

    conf

  • DOI
    10.1109/IVELEC.2010.5503468
  • Filename
    5503468