DocumentCode
2925844
Title
P4-19: Tracing backscattered electrons in full energy range
Author
Munro, Eric ; Rouse, John ; Zhu, Xieqing ; Katsap, Victor
Author_Institution
Munro´´s Electron Beam Software Ltd., London, UK
fYear
2010
fDate
18-20 May 2010
Firstpage
483
Lastpage
484
Abstract
It is critically important to know backscattered electron (BSE) trajectories and current density in electron beam lithography tools, where a 50 keV electron beam is incident upon the target plane. The space near the target plane is occupied by closely-spaced optical components and sensors, all prone to surface charging. We have reported previously the results of testing SOURCEBS rev.1.0, a software for tracing BSE´s of known energy value. Recently, we have developed SOURCEBS rev. 4.0. This software takes the full spectrum of BSE energies and initial coordinates from MONSEL, an electron-solid state modeling software program. SOURCEBS rev. 4.0 traces BSE´s with their full energy spectrum in electrostatic and magnetic fields, and computes the BSE current density at user-chosen surfaces.
Keywords
electron backscattering; electron beam lithography; MONSEL; SOURCEBS rev.1.0; backscattered electrons; closely-spaced optical components; current density; electron beam lithography; electron-solid state modeling software; sensors; surface charging; Current density; Electron beams; Electrostatics; Lithography; Optical devices; Optical sensors; Software testing; Space charge; Surface charging; Trajectory; backscattered electrons; e-beam lithography; energy distribution;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-7098-3
Type
conf
DOI
10.1109/IVELEC.2010.5503468
Filename
5503468
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