• DocumentCode
    2925897
  • Title

    CAD challenges for 3D ICs

  • Author

    Kung, David ; Puri, Ruchir

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY
  • fYear
    2009
  • fDate
    19-22 Jan. 2009
  • Firstpage
    421
  • Lastpage
    422
  • Abstract
    A fundamental shift in the technology has occurred at 90 nm CMOS and beyond where the interconnect resistance has been increasing so much that the distance a clock cycle can reach has been dwindling as a fraction of the dimension of the chip. to cause a repeater explosion problem. This problem translates into an explosion of repeaters which not only added significant overhead in area but also power, as repeaters are major contributors to leakage. By reaching out to the vertical dimension, 3D technology has the potential of easing repeater explosion (Figure 1), reducing latency between units, increasing memory bandwidth and integrating heterogeneous technologies. However, in order to exploit the full potential of 3D technology, new challenges in the area of system level design and analysis, physical design, thermal analysis need to be addressed.
  • Keywords
    CMOS integrated circuits; circuit CAD; integrated circuit interconnections; thermal analysis; 3D integrated circuit; CMOS integrated circuit; circuit CAD; clock cycle; interconnect resistance; physical design; repeater explosion; size 90 nm; system level design; thermal analysis; Bandwidth; CMOS technology; Clocks; Costs; Delay; Explosions; Logic; Performance analysis; Repeaters; System-level design;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2009. ASP-DAC 2009. Asia and South Pacific
  • Conference_Location
    Yokohama
  • Print_ISBN
    978-1-4244-2748-2
  • Electronic_ISBN
    978-1-4244-2749-9
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2009.4796517
  • Filename
    4796517