DocumentCode
2925897
Title
CAD challenges for 3D ICs
Author
Kung, David ; Puri, Ruchir
Author_Institution
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY
fYear
2009
fDate
19-22 Jan. 2009
Firstpage
421
Lastpage
422
Abstract
A fundamental shift in the technology has occurred at 90 nm CMOS and beyond where the interconnect resistance has been increasing so much that the distance a clock cycle can reach has been dwindling as a fraction of the dimension of the chip. to cause a repeater explosion problem. This problem translates into an explosion of repeaters which not only added significant overhead in area but also power, as repeaters are major contributors to leakage. By reaching out to the vertical dimension, 3D technology has the potential of easing repeater explosion (Figure 1), reducing latency between units, increasing memory bandwidth and integrating heterogeneous technologies. However, in order to exploit the full potential of 3D technology, new challenges in the area of system level design and analysis, physical design, thermal analysis need to be addressed.
Keywords
CMOS integrated circuits; circuit CAD; integrated circuit interconnections; thermal analysis; 3D integrated circuit; CMOS integrated circuit; circuit CAD; clock cycle; interconnect resistance; physical design; repeater explosion; size 90 nm; system level design; thermal analysis; Bandwidth; CMOS technology; Clocks; Costs; Delay; Explosions; Logic; Performance analysis; Repeaters; System-level design;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2009. ASP-DAC 2009. Asia and South Pacific
Conference_Location
Yokohama
Print_ISBN
978-1-4244-2748-2
Electronic_ISBN
978-1-4244-2749-9
Type
conf
DOI
10.1109/ASPDAC.2009.4796517
Filename
4796517
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